suspended CVD graphene
Office 1.14
lukyi.cheung-at-unibas.ch
Phone: +41 61 267 37 03
Education
Apr 2019 – present | PhD Student in Physics, University of Basel |
Oct 2016 – Sep 2018 | M.Sc. in Physics, RWTH Aachen University
Thesis: “Impact of Gate Resistance on Noise Performance of 130-nm Node Fully-Depleted Bulk MOSFETs” in Infineon Technologies Dresden GmbH & Co. KG with supervision by Prof. Hendrik Bluhm at Institute for Quantum Information |